Controlled Self-Assembly of Hexagonal Nanoparticle Patterns on Nanotopographies
Diblock copolymer micelle nanolithography (BCML) is a versatile and efficient method to cover large surface areas with hexagonally ordered arrays of metal nanoparticles, in which the nanoparticles are equally spaced. However, this method falls short of providing a controlled allocation of such regul...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 31(2015), 34 vom: 01. Sept., Seite 9261-5 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2015
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Online verfügbar |
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