Record Charge Carrier Diffusion Length in Colloidal Quantum Dot Solids via Mutual Dot-To-Dot Surface Passivation

© 2015 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 27(2015), 21 vom: 03. Juni, Seite 3325-30
1. Verfasser: Carey, Graham H (VerfasserIn)
Weitere Verfasser: Levina, Larissa, Comin, Riccardo, Voznyy, Oleksandr, Sargent, Edward H
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2015
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article colloidal quantum dots diffusion length surface passivation surface-to-volume ratio
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520 |a Through a combination of chemical and mutual dot-to-dot surface passivation, high-quality colloidal quantum dot solids are fabricated. The joint passivation techniques lead to a record diffusion length for colloidal quantum dots of 230 ± 20 nm. The technique is applied to create thick photovoltaic devices that exhibit high current density without losing fill factor 
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700 1 |a Comin, Riccardo  |e verfasserin  |4 aut 
700 1 |a Voznyy, Oleksandr  |e verfasserin  |4 aut 
700 1 |a Sargent, Edward H  |e verfasserin  |4 aut 
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