Style de citation APA

Park, M. H., Lee, Y. H., Kim, H. J., Kim, Y. J., Moon, T., Kim, K. D., . . . Hwang, C. S. (2015). Ferroelectricity and antiferroelectricity of doped thin HfO2-based films. Advanced materials (Deerfield Beach, Fla.), 27(11), 1811. https://doi.org/10.1002/adma.201404531

Style de citation Chicago

Park, Min Hyuk, et al. "Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-based Films." Advanced Materials (Deerfield Beach, Fla.) 27, no. 11 (2015): 1811. https://dx.doi.org/10.1002/adma.201404531.

Style de citation MLA

Park, Min Hyuk, et al. "Ferroelectricity and Antiferroelectricity of Doped Thin HfO2-based Films." Advanced Materials (Deerfield Beach, Fla.), vol. 27, no. 11, 2015, p. 1811.