Electrophoretic deposition on nonconducting substrates : a demonstration of the application to microwave devices

Through the use of a sacrificial carbon layer, this work reports a method of performing electrophoretic deposition (EPD) of thick films on fully nonconducting substrates, overcoming the restricting requirement for EPD of a conducting or partially conducting substrate. As a proof of concept, the meth...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 31(2015), 7 vom: 24. Feb., Seite 2127-35
1. Verfasser: Vilarinho, Paula M (VerfasserIn)
Weitere Verfasser: Fu, Zhi, Wu, Aiying, Axelsson, Anna, Kingon, Angus I
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2015
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
LEADER 01000naa a22002652 4500
001 NLM245792767
003 DE-627
005 20231224141641.0
007 cr uuu---uuuuu
008 231224s2015 xx |||||o 00| ||eng c
024 7 |a 10.1021/la504184k  |2 doi 
028 5 2 |a pubmed24n0819.xml 
035 |a (DE-627)NLM245792767 
035 |a (NLM)25635508 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Vilarinho, Paula M  |e verfasserin  |4 aut 
245 1 0 |a Electrophoretic deposition on nonconducting substrates  |b a demonstration of the application to microwave devices 
264 1 |c 2015 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 06.08.2015 
500 |a Date Revised 24.02.2015 
500 |a published: Print-Electronic 
500 |a Citation Status PubMed-not-MEDLINE 
520 |a Through the use of a sacrificial carbon layer, this work reports a method of performing electrophoretic deposition (EPD) of thick films on fully nonconducting substrates, overcoming the restricting requirement for EPD of a conducting or partially conducting substrate. As a proof of concept, the method was applied to the development of microwave-thick films on insulating alumina substrates. The key parameter to be controlled is the thickness of the sacrificial carbon layer; this is expected to be a general result for the application of the processing method. The method allows direct patterning of the structure and leads to the potential use of EPD in a far wider range of electronic applications (multilayer ceramic capacitors (MLCCs), low-temperature cofired ceramics (LTTCs), and biotech devices). Furthermore, in conjunction with work reported elsewhere, the development of specific BaNd2Ti5O14 (BNT) thick-film microwave dielectrics opens up a technology platform for a range of high-quality factor (Q) devices. More specifically, 100-μm-thick BNT layers were achieved with a dielectric constant of 149 and Q of 1161 (10 GHz). These materials can now be integrated with tunable dielectrics or dielectrics on metal substrates to provide a platform for devices in the front end of communication systems and cellular base stations 
650 4 |a Journal Article 
700 1 |a Fu, Zhi  |e verfasserin  |4 aut 
700 1 |a Wu, Aiying  |e verfasserin  |4 aut 
700 1 |a Axelsson, Anna  |e verfasserin  |4 aut 
700 1 |a Kingon, Angus I  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Langmuir : the ACS journal of surfaces and colloids  |d 1992  |g 31(2015), 7 vom: 24. Feb., Seite 2127-35  |w (DE-627)NLM098181009  |x 1520-5827  |7 nnns 
773 1 8 |g volume:31  |g year:2015  |g number:7  |g day:24  |g month:02  |g pages:2127-35 
856 4 0 |u http://dx.doi.org/10.1021/la504184k  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_22 
912 |a GBV_ILN_350 
912 |a GBV_ILN_721 
951 |a AR 
952 |d 31  |j 2015  |e 7  |b 24  |c 02  |h 2127-35