Parallel near-field photolithography with metal-coated elastomeric masks

Developing a cost-effective nanolithography strategy that enables the production of subwavelength features with various shapes over large areas is a long-standing goal in the nanotechnology community. Herein, an inexpensive nanolithographic technique that combines the wafer-scale production capabili...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 31(2015), 3 vom: 27. Jan., Seite 1210-7
1. Verfasser: Wu, Jin (VerfasserIn)
Weitere Verfasser: Yu, Cheng-han, Li, Shaozhou, Zou, Binghua, Liu, Yayuan, Zhu, Xiaoqun, Guo, Yuanyuan, Xu, Hongbo, Zhang, Weina, Zhang, Liping, Liu, Bin, Tian, Danbi, Huang, Wei, Sheetz, Michael P, Huo, Fengwei
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2015
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Dimethylpolysiloxanes Gold 7440-57-5 Polymethyl Methacrylate 9011-14-7