Tuning the phase transition of ZnO thin films through lithography : an integrated bottom-up and top-down processing
An innovative approach towards the physico-chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol-gel method and then exposed to hard X-rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating age...
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Journal of synchrotron radiation. - 1994. - 22(2015), 1 vom: 21. Jan., Seite 165-71
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| 1. Verfasser: |
Malfatti, Luca
(VerfasserIn) |
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| Weitere Verfasser: |
Pinna, Alessandra,
Enzo, Stefano,
Falcaro, Paolo,
Marmiroli, Benedetta,
Innocenzi, Plinio |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2015
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| Zugriff auf das übergeordnete Werk: | Journal of synchrotron radiation
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| Schlagworte: | Journal Article
Research Support, Non-U.S. Gov't
bottom-up/top-down
lithography
sol–gel
thin film
zinc oxide |
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