Monitoring the thin film formation during sputter deposition of vanadium carbide

The thin film formation of magnetron sputtered polycrystalline coatings was monitored by in situ X-ray reflectivity measurements. The measured intensity was analyzed using the Parratt algorithm for time-dependent thin film systems. Guidelines for the on-line interpretation of the data were developed...

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Publié dans:Journal of synchrotron radiation. - 1994. - 22(2015), 1 vom: 21. Jan., Seite 76-85
Auteur principal: Kaufholz, Marthe (Auteur)
Autres auteurs: Krause, Bärbel, Kotapati, Sunil, Köhl, Martin, Mantilla, Miguel F, Stüber, Michael, Ulrich, Sven, Schneider, Reinhard, Gerthsen, Dagmar, Baumbach, Tilo
Format: Article en ligne
Langue:English
Publié: 2015
Accès à la collection:Journal of synchrotron radiation
Sujets:Journal Article Research Support, Non-U.S. Gov't composite in situ X-ray reflectivity sputter deposition