Monitoring the thin film formation during sputter deposition of vanadium carbide

The thin film formation of magnetron sputtered polycrystalline coatings was monitored by in situ X-ray reflectivity measurements. The measured intensity was analyzed using the Parratt algorithm for time-dependent thin film systems. Guidelines for the on-line interpretation of the data were developed...

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Veröffentlicht in:Journal of synchrotron radiation. - 1994. - 22(2015), 1 vom: 10. Jan., Seite 76-85
1. Verfasser: Kaufholz, Marthe (VerfasserIn)
Weitere Verfasser: Krause, Bärbel, Kotapati, Sunil, Köhl, Martin, Mantilla, Miguel F, Stüber, Michael, Ulrich, Sven, Schneider, Reinhard, Gerthsen, Dagmar, Baumbach, Tilo
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2015
Zugriff auf das übergeordnete Werk:Journal of synchrotron radiation
Schlagworte:Journal Article Research Support, Non-U.S. Gov't composite in situ X-ray reflectivity sputter deposition