Tribology of Si/SiO2 in humid air : transition from severe chemical wear to wearless behavior at nanoscale
Wear at sliding interfaces of silicon is a main cause for material loss in nanomanufacturing and device failure in microelectromechanical system (MEMS) applications. However, a comprehensive understanding of the nanoscale wear mechanisms of silicon in ambient conditions is still lacking. Here, we re...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 31(2015), 1 vom: 13. Jan., Seite 149-56
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| 1. Verfasser: |
Chen, Lei
(VerfasserIn) |
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| Weitere Verfasser: |
He, Hongtu,
Wang, Xiaodong,
Kim, Seong H,
Qian, Linmao |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2015
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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