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231224s2014 xx |||||o 00| ||eng c |
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|a 10.1021/la503819z
|2 doi
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|a pubmed24n0811.xml
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|a eng
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|a Collins, Gillian
|e verfasserin
|4 aut
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|a Germanium oxide removal by citric acid and thiol passivation from citric acid-terminated Ge(100)
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|c 2014
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|a Text
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|2 rdacontent
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|a ƒaComputermedien
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|a Date Completed 15.07.2015
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|a Date Revised 02.12.2014
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a Many applications of germanium (Ge) are underpinned by effective oxide removal and surface passivation. This important surface treatment step often requires H-X (X = Cl, Br, I) or HF etchants. Here, we show that aqueous citric acid solutions are effective in the removal of GeOx. The stability of citric acid-treated Ge(100) is compared to HF and HCl treated surfaces and analyzed by X-ray photoelectron spectroscopy. Further Ge surface passivation was investigated by thiolation using alkane monothiols and dithiols. The organic passivation layers show good stability with no oxide regrowth observed after 3 days of ambient exposure
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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|a Germanium
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|a Citric Acid
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|a germanium oxide
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|2 NLM
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|a Aureau, Damien
|e verfasserin
|4 aut
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|a Holmes, Justin D
|e verfasserin
|4 aut
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|a Etcheberry, Arnaud
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|a O'Dwyer, Colm
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1999
|g 30(2014), 47 vom: 02. Dez., Seite 14123-7
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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|g volume:30
|g year:2014
|g number:47
|g day:02
|g month:12
|g pages:14123-7
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|u http://dx.doi.org/10.1021/la503819z
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