Confinement-Induced Enhancement of Antigen-Antibody Interactions within Binary Nanopatterns to Achieve Higher Efficiency of On-Chip Immunosensors
Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
| Veröffentlicht in: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 20(2008), 14 vom: 17. Juli, Seite 2782-8 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2008
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| Zugriff auf das übergeordnete Werk: | Advanced materials (Deerfield Beach, Fla.) |
| Schlagworte: | Journal Article lithography sensors surface patterning surface plasmon resonance |
| Zusammenfassung: | Copyright © 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. By combining molecular self-assembly, nanosphere lithography and reactive ion etching, large-scale nanopatterns of antibodies are fabricated for direct application in state-of-the-art on-chip immunosensors. Using in-situ surface plasmon resonance, the patterns are studied in view of their antigen binding capacity, which shows an increase of up to 120% solely in the case of antibody confinement into the nanopatches by means of a nonfouling embedding matrix |
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| Beschreibung: | Date Completed 13.09.2014 Date Revised 30.09.2020 published: Print-Electronic Citation Status PubMed-not-MEDLINE |
| ISSN: | 1521-4095 |
| DOI: | 10.1002/adma.200702188 |