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231224s2014 xx |||||o 00| ||eng c |
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7 |
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|a 10.1021/la404903c
|2 doi
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|a eng
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1 |
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|a Teng, Dayong
|e verfasserin
|4 aut
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| 245 |
1 |
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|a High-density silicon nanowires prepared via a two-step template method
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|c 2014
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| 336 |
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
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|2 rdamedia
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|a Date Completed 20.10.2014
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|a Date Revised 05.03.2014
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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|a High density ordered Si nanowire arrays can be fabricated from a Fe2O3 template annealed from polystyrene (PS) microsphere layers via a metal-assisted chemical etching method. The metal mesh films, containing position- and density-defined pores that determine the position and density of the remaining structures after etching, are extremely important for achieving high quality Si nanowires. By adding a structural inversion process, a Au metal mesh with arrays of high density nanopores is devised as a catalyst for metal-assisted chemical etching of silicon. The density of Si nanowires can be increased to two times that of the single-layer PS microspheres and further to three times when a double layer of PS microspheres is introduced. The two-step template method for the preparation of high-density Si nanowires shows great potential in the fields of nanofabrication and nanoelectronics
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|a Journal Article
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| 700 |
1 |
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|a Wu, Luo
|e verfasserin
|4 aut
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| 700 |
1 |
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|a He, Weiwei
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Ye, Changhui
|e verfasserin
|4 aut
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| 773 |
0 |
8 |
|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1985
|g 30(2014), 8 vom: 04. März, Seite 2259-65
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnas
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| 773 |
1 |
8 |
|g volume:30
|g year:2014
|g number:8
|g day:04
|g month:03
|g pages:2259-65
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|u http://dx.doi.org/10.1021/la404903c
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