Area Selective Growth of Titanium Diselenide Thin Films into Micropatterned Substrates by Low-Pressure Chemical Vapor Deposition

Area Selective Growth of Titanium Diselenide Thin Films into Micropatterned Substrates by Low-Pressure Chemical Vapor Deposition

The neutral, distorted octahedral complex [TiCl4(Se n Bu2)2] (1), prepared from the reaction of TiCl4 with the neutral Se n Bu2 in a 1:2 ratio and characterized by IR and multinuclear (1H, 13C{1H}, 77Se{1H}) NMR spectroscopy and microanalysis, serves as an efficient single-source precursor for low-p...

Description complète

Détails bibliographiques
Publié dans:Chemistry of materials : a publication of the American Chemical Society. - 1998. - 25(2013), 23 vom: 10. Dez., Seite 4719-4724
Auteur principal: Benjamin, Sophie L (Auteur)
Autres auteurs: de Groot, C H Kees, Gurnani, Chitra, Hector, Andrew L, Huang, Ruomeng, Ignatyev, Konstantin, Levason, William, Pearce, Stuart J, Thomas, Fiona, Reid, Gillian
Format: Article
Langue:English
Publié: 2013
Accès à la collection:Chemistry of materials : a publication of the American Chemical Society
Sujets:Journal Article Selective deposition chemical vapor deposition microfocus X-ray diffraction selenoether single-source precursor titanium selenide