Area Selective Growth of Titanium Diselenide Thin Films into Micropatterned Substrates by Low-Pressure Chemical Vapor Deposition

Area Selective Growth of Titanium Diselenide Thin Films into Micropatterned Substrates by Low-Pressure Chemical Vapor Deposition

The neutral, distorted octahedral complex [TiCl4(Se n Bu2)2] (1), prepared from the reaction of TiCl4 with the neutral Se n Bu2 in a 1:2 ratio and characterized by IR and multinuclear (1H, 13C{1H}, 77Se{1H}) NMR spectroscopy and microanalysis, serves as an efficient single-source precursor for low-p...

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Veröffentlicht in:Chemistry of materials : a publication of the American Chemical Society. - 1998. - 25(2013), 23 vom: 10. Dez., Seite 4719-4724
1. Verfasser: Benjamin, Sophie L (VerfasserIn)
Weitere Verfasser: de Groot, C H Kees, Gurnani, Chitra, Hector, Andrew L, Huang, Ruomeng, Ignatyev, Konstantin, Levason, William, Pearce, Stuart J, Thomas, Fiona, Reid, Gillian
Format: Aufsatz
Sprache:English
Veröffentlicht: 2013
Zugriff auf das übergeordnete Werk:Chemistry of materials : a publication of the American Chemical Society
Schlagworte:Journal Article Selective deposition chemical vapor deposition microfocus X-ray diffraction selenoether single-source precursor titanium selenide