Design of an ultrahigh-energy-resolution and wide-energy-range soft X-ray beamline

A new ultrahigh-energy-resolution and wide-energy-range soft X-ray beamline has been designed and is under construction at the Shanghai Synchrotron Radiation Facility. The beamline has two branches: one dedicated to angle-resolved photoemission spectroscopy (ARPES) and the other to photoelectron emi...

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Veröffentlicht in:Journal of synchrotron radiation. - 1994. - 21(2014), Pt 1 vom: 15. Jan., Seite 273-9
1. Verfasser: Xue, L (VerfasserIn)
Weitere Verfasser: Reininger, R, Wu, Y-Q, Zou, Y, Xu, Z-M, Shi, Y-B, Dong, J, Ding, H, Sun, J-L, Guo, F-Z, Wang, Y, Tai, R-Z
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2014
Zugriff auf das übergeordnete Werk:Journal of synchrotron radiation
Schlagworte:Journal Article ARPES soft X-ray beamline thermal deformation ultrahigh-energy resolution
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520 |a A new ultrahigh-energy-resolution and wide-energy-range soft X-ray beamline has been designed and is under construction at the Shanghai Synchrotron Radiation Facility. The beamline has two branches: one dedicated to angle-resolved photoemission spectroscopy (ARPES) and the other to photoelectron emission microscopy (PEEM). The two branches share the same plane-grating monochromator, which is equipped with four variable-line-spacing gratings and covers the 20-2000 eV energy range. Two elliptically polarized undulators are employed to provide photons with variable polarization, linear in every inclination and circular. The expected energy resolution is approximately 10 meV at 1000 eV with a flux of more than 3 × 10(10) photons s(-1) at the ARPES sample positions. The refocusing of both branches is based on Kirkpatrick-Baez pairs. The expected spot sizes when using a 10 µm exit slit are 15 µm × 5 µm (horizontal × vertical FWHM) at the ARPES station and 10 µm × 5 µm (horizontal × vertical FWHM) at the PEEM station. The use of plane optical elements upstream of the exit slit, a variable-line-spacing grating and a pre-mirror in the monochromator that allows the influence of the thermal deformation to be eliminated are essential for achieving the ultrahigh-energy resolution 
650 4 |a Journal Article 
650 4 |a ARPES 
650 4 |a soft X-ray beamline 
650 4 |a thermal deformation 
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700 1 |a Reininger, R  |e verfasserin  |4 aut 
700 1 |a Wu, Y-Q  |e verfasserin  |4 aut 
700 1 |a Zou, Y  |e verfasserin  |4 aut 
700 1 |a Xu, Z-M  |e verfasserin  |4 aut 
700 1 |a Shi, Y-B  |e verfasserin  |4 aut 
700 1 |a Dong, J  |e verfasserin  |4 aut 
700 1 |a Ding, H  |e verfasserin  |4 aut 
700 1 |a Sun, J-L  |e verfasserin  |4 aut 
700 1 |a Guo, F-Z  |e verfasserin  |4 aut 
700 1 |a Wang, Y  |e verfasserin  |4 aut 
700 1 |a Tai, R-Z  |e verfasserin  |4 aut 
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