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231224s2014 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201304591
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|a eng
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|a Xue, Changying
|e verfasserin
|4 aut
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|a Complex dynamic substrate control
|b dual-tone hydrogel photoresists allow double-dissociation of topography and modulus
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|c 2014
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|a Text
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|a ƒaComputermedien
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|a Date Completed 04.11.2014
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|a Date Revised 10.06.2024
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a Complex substrate control is demonstrated with a dual-tone hydrogel photoresist. By exposing a photodegradable hydrogel to UV light through a photomask, both swollen and eroded micropatterns with a decreased modulus can be created on the surface under different exposure conditions. This provides an important tool for investigating the synergistic effects of spatially heterogeneous mechanical and topological cues on cell behavior
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|a Journal Article
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|a Research Support, N.I.H., Extramural
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|a complex topographic patterns
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|a dual-tone photoresist
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|a dynamic control
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|a elastic pattern
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|a photodegradable hydrogels
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|a Biocompatible Materials
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|a Hydrogel, Polyethylene Glycol Dimethacrylate
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|a 25852-47-5
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|a Polyethylene Glycols
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|a Wong, Darice Y
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|a Kasko, Andrea M
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|t Advanced materials (Deerfield Beach, Fla.)
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|g 26(2014), 10 vom: 12. März, Seite 1577-83
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|g day:12
|g month:03
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