An in situ grazing incidence X-ray scattering study of block copolymer thin films during solvent vapor annealing

© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 26(2014), 2 vom: 15. Jan., Seite 273-81
1. Verfasser: Gu, Xiaodan (VerfasserIn)
Weitere Verfasser: Gunkel, Ilja, Hexemer, Alexander, Gu, Weiyin, Russell, Thomas P
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2014
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Research Support, U.S. Gov't, Non-P.H.S. block copolymers thin film in situ GISAXS lateral ordering and solvent removal rates solvent vapor annealing
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520 |a In situ grazing-incidence small-angle X-ray scattering experiments on thin films of block copolymers during annealing in neutral solvent vapors are reported. By removing the solvent in a controlled manner, the period of the microphase separated morphology is found to increase with increasing block copolymer concentration in a power law manner with an exponent ∼ 2/3. By venting the systems at different rates during the solvent removal process, kinetically arresting the system, the period of the microphase separated morphology in the dried film can be varied 
650 4 |a Journal Article 
650 4 |a Research Support, Non-U.S. Gov't 
650 4 |a Research Support, U.S. Gov't, Non-P.H.S. 
650 4 |a block copolymers thin film 
650 4 |a in situ GISAXS 
650 4 |a lateral ordering and solvent removal rates 
650 4 |a solvent vapor annealing 
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700 1 |a Hexemer, Alexander  |e verfasserin  |4 aut 
700 1 |a Gu, Weiyin  |e verfasserin  |4 aut 
700 1 |a Russell, Thomas P  |e verfasserin  |4 aut 
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