Direct photolithography of perfluoropolyethers for solvent-resistant microfluidics
In this work, photocurable perfluoropolyethers (PFPEs) have been used for the fabrication of microfluidic devices by a direct photolithographic process. During this mask-assisted photopolymerization technique, the material is directly photopolymerized in the presence of a mask, avoiding the use of a...
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 29(2013), 50 vom: 17. Dez., Seite 15711-8
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| 1. Verfasser: |
Vitale, Alessandra
(VerfasserIn) |
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| Weitere Verfasser: |
Quaglio, Marzia,
Marasso, Simone L,
Chiodoni, Angelica,
Cocuzza, Matteo,
Bongiovanni, Roberta |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2013
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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