A simple and scalable route to wafer-size patterned graphene
Producing large-scale graphene films with controllable patterns is an essential component of graphene-based nanodevice fabrication. Current methods of graphene pattern preparation involve either high cost, low throughput patterning processes or sophisticated instruments, hindering their large-scale...
| Veröffentlicht in: | Journal of materials chemistry. - 1998. - 20(2010), 24 vom: 28. Juni, Seite 5041-5046 |
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| 1. Verfasser: | |
| Weitere Verfasser: | , , , , |
| Format: | Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2010
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| Zugriff auf das übergeordnete Werk: | Journal of materials chemistry |
| Schlagworte: | Journal Article |
| Zusammenfassung: | Producing large-scale graphene films with controllable patterns is an essential component of graphene-based nanodevice fabrication. Current methods of graphene pattern preparation involve either high cost, low throughput patterning processes or sophisticated instruments, hindering their large-scale fabrication and practical applications. We report a simple, effective, and reproducible approach for patterning graphene films with controllable feature sizes and shapes. The patterns were generated using a versatile photocoupling chemistry. Features from micrometres to centimetres were fabricated using a conventional photolithography process. This method is simple, general, and applicable to a wide range of substrates including silicon wafers, glass slides, and metal films |
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| Beschreibung: | Date Revised 21.10.2021 published: Print Citation Status PubMed-not-MEDLINE |
| ISSN: | 0959-9428 |