Precise patterning of silk microstructures using photolithography

Precise patterning of silk microstructures using photolithography

© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 25(2013), 43 vom: 20. Nov., Seite 6207-12
1. Verfasser: Kurland, Nicholas E (VerfasserIn)
Weitere Verfasser: Dey, Tuli, Kundu, Subhas C, Yadavalli, Vamsi K
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2013
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't fibroin micropatterning photolithography protein photoresist silk
Beschreibung
Zusammenfassung:© 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Photolithography is used in conjunction with a "silk fibroin photoresist" to form precise protein microstructures directly and rapidly on a variety of substrates. High-resolution features in two and three dimensions with line widths down to one micrometer are formed. Photo-crosslinked protein structures guide cell adhesion, providing precise spatial control of cells without requiring adhesive ligands
Beschreibung:Date Completed 06.07.2014
Date Revised 01.10.2020
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201302823