Combining UV lithography and an imprinting technique for patterning metal-organic frameworks

Combining UV lithography and an imprinting technique for patterning metal-organic frameworks

Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Détails bibliographiques
Publié dans:Advanced materials (Deerfield Beach, Fla.). - 1998. - 25(2013), 34 vom: 14. Sept., Seite 4701-5
Auteur principal: Doherty, Cara M (Auteur)
Autres auteurs: Grenci, Gianluca, Riccò, Raffaele, Mardel, James I, Reboul, Julien, Furukawa, Shuhei, Kitagawa, Susumu, Hill, Anita J, Falcaro, Paolo
Format: Article en ligne
Langue:English
Publié: 2013
Accès à la collection:Advanced materials (Deerfield Beach, Fla.)
Sujets:Journal Article Research Support, Non-U.S. Gov't UV lithography device fabrication imprinting metal-organic frameworks patterning
Description
Résumé:Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Thin metal-organic framework (MOF) films are patterned using UV lithography and an imprinting technique. A UV lithographed SU-8 film is imprinted onto a film of MOF powder forming a 2D MOF patterned film. This straightforward method can be applied to most MOF materials, is versatile, cheap, and potentially useful for commercial applications such as lab-on-a-chip type devices
Description:Date Completed 24.03.2014
Date Revised 30.09.2020
published: Print-Electronic
Citation Status PubMed-not-MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201301383