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231224s2013 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201300813
|2 doi
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|a pubmed24n0762.xml
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|a (DE-627)NLM228627761
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|a (NLM)23798365
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|a DE-627
|b ger
|c DE-627
|e rakwb
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|a eng
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| 100 |
1 |
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|a Son, Jeong Gon
|e verfasserin
|4 aut
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| 245 |
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|a Sub-10 nm Graphene Nanoribbon Array field-effect transistors fabricated by block copolymer lithography
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|c 2013
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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| 500 |
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|a Date Completed 24.03.2014
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|a Date Revised 30.09.2020
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a Sub-10 nm Graphene Nanoribbon Arrays are fabricated over large areas by etching CVD-grown graphene. A mask is used made by the directed self-assembly of a cylindrical PS-b-PDMS block copolymer under solvent annealing guided by a removable template. The optimized solvent annealing process, surface-modified removable polymeric templates, and high Flory-Huggins interaction parameters of the block copolymer enable a highly aligned array of nanoribbons with low line edge roughness to be formed. This leads to a higher on/off ratio and stronger temperature dependence of the current for nanoribbon FETs, and a photocurrent which is 30 times larger compared to unpatterned graphene
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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|a Research Support, U.S. Gov't, Non-P.H.S.
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|a block copolymer
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|a graphene
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|a nanofabrication
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|a nanoribbon
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|a transistor
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|a Dimethylpolysiloxanes
|2 NLM
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|a Nanotubes, Carbon
|2 NLM
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|a Nylons
|2 NLM
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|a poly(dimethylsiloxane)-polyamide copolymer
|2 NLM
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|a Graphite
|2 NLM
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|a 7782-42-5
|2 NLM
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| 700 |
1 |
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|a Son, Myungwoo
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Moon, Kyeong-Joo
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Lee, Byoung Hun
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Myoung, Jae-Min
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Strano, Michael S
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Ham, Moon-Ho
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Ross, Caroline A
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
|d 1998
|g 25(2013), 34 vom: 14. Sept., Seite 4723-8
|w (DE-627)NLM098206397
|x 1521-4095
|7 nnns
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| 773 |
1 |
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|g volume:25
|g year:2013
|g number:34
|g day:14
|g month:09
|g pages:4723-8
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|u http://dx.doi.org/10.1002/adma.201300813
|3 Volltext
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