Effect of surface charge density on the affinity of oxide nanoparticles for the vapor-water interface

Using in-situ X-ray photoelectron spectroscopy at the vapor-water interface, the affinity of nanometer-sized silica colloids to adsorb at the interface is shown to depend on colloid surface charge density. In aqueous suspensions at pH 10 corrected Debye-Hückel theory for surface complexation calcula...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 29(2013), 16 vom: 23. Apr., Seite 5023-9
1. Verfasser: Brown, Matthew A (VerfasserIn)
Weitere Verfasser: Duyckaerts, Nicolas, Redondo, Amaia Beloqui, Jordan, Inga, Nolting, Frithjof, Kleibert, Armin, Ammann, Markus, Wörner, Hans Jakob, van Bokhoven, Jeroen A, Abbas, Zareen
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2013
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
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520 |a Using in-situ X-ray photoelectron spectroscopy at the vapor-water interface, the affinity of nanometer-sized silica colloids to adsorb at the interface is shown to depend on colloid surface charge density. In aqueous suspensions at pH 10 corrected Debye-Hückel theory for surface complexation calculations predict that smaller silica colloids have increased negative surface charge density that originates from enhanced screening of deprotonated silanol groups (≡Si-O(-)) by counterions in the condensed ion layer. The increased negative surface charge density results in an electrostatic repulsion from the vapor-water interface that is seen to a lesser extent for larger particles that have a reduced charge density in the XPS measurements. We compare the results and interpretation of the in-situ XPS and corrected Debye-Hückel theory for surface complexation calculations with traditional surface tension measurements. Our results show that controlling the surface charge density of colloid particles can regulate their adsorption to the interface between two dielectrics 
650 4 |a Journal Article 
700 1 |a Duyckaerts, Nicolas  |e verfasserin  |4 aut 
700 1 |a Redondo, Amaia Beloqui  |e verfasserin  |4 aut 
700 1 |a Jordan, Inga  |e verfasserin  |4 aut 
700 1 |a Nolting, Frithjof  |e verfasserin  |4 aut 
700 1 |a Kleibert, Armin  |e verfasserin  |4 aut 
700 1 |a Ammann, Markus  |e verfasserin  |4 aut 
700 1 |a Wörner, Hans Jakob  |e verfasserin  |4 aut 
700 1 |a van Bokhoven, Jeroen A  |e verfasserin  |4 aut 
700 1 |a Abbas, Zareen  |e verfasserin  |4 aut 
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