Ultralow reflection from a-Si nanograss/Si nanofrustum double layers

Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 25(2013), 12 vom: 25. März, Seite 1724-8
1. Verfasser: Ravipati, Srikanth (VerfasserIn)
Weitere Verfasser: Shieh, Jiann, Ko, Fu-Hsiang, Yu, Chen-Chieh, Chen, Hsuen-Li
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2013
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't
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520 |a A double-layer nanostructure comprising amorphous Si nanograss on top of Si nanofrustums (NFs) with a total height of 680 nm exhibits ultralow reflection. Almost near-unity absorption and near-zero reflectance result in this layered nanostructure, over a broad range of wavelengths and a wide range of angles of incidence, due to the low packing density of a-Si and the smooth transition of the refractive index from the air to the Si substrate across both the nanograss and NF layers 
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650 4 |a Research Support, Non-U.S. Gov't 
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700 1 |a Ko, Fu-Hsiang  |e verfasserin  |4 aut 
700 1 |a Yu, Chen-Chieh  |e verfasserin  |4 aut 
700 1 |a Chen, Hsuen-Li  |e verfasserin  |4 aut 
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