Constructing robust and functional micropatterns on polystyrene surfaces by using deep UV irradiation
We report the preparation of different surface patterns based on the photo-cross-linking/degradation kinetics of polystyrene (PS) by using UV light. Upon exposure to UV light, PS can be initially cross-linked, whereas an excess of the exposure time or intensity provokes the degradation of the materi...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 29(2013), 8 vom: 26. Feb., Seite 2756-63 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2013
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article Research Support, Non-U.S. Gov't Polystyrenes |
| Online verfügbar |
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