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231224s2013 xx |||||o 00| ||eng c |
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|a 10.1021/la304670c
|2 doi
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|a DE-627
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|a eng
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| 100 |
1 |
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|a Watanabe, Hirohmi
|e verfasserin
|4 aut
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| 245 |
1 |
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|a Concealing surface topography by attachment of nanometer-thick film
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| 264 |
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|c 2013
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
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| 500 |
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|a Date Completed 16.08.2013
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|a Date Revised 06.03.2013
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|a published: Print-Electronic
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|a Citation Status PubMed-not-MEDLINE
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| 520 |
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|a Concealing of surface topology of substrates by decal-like attachment of nanomembrane is demonstrated. The nanomembrane attachment provides a flat surface on various substrates, including porous substrates, and the surface property such as wettability was changed to that of the nanomembrane. The monitoring of drying process revealed that a nanomembrane with certain thickness tolerates their flexural deflection during the procedure. Moreover, the supporting position of nanomembranes as well as the physical properties of nanomembranes strongly affected the degree of deflection. The decal-like attachment of nanomembranes shown here is potentially a powerful method for creating a new functional surface that is independent of the topological and chemical properties of the original substrate
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| 650 |
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|a Journal Article
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| 700 |
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|a Fujimoto, Aya
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Takahara, Atsushi
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 29(2013), 9 vom: 05. März, Seite 2906-11
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
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|g volume:29
|g year:2013
|g number:9
|g day:05
|g month:03
|g pages:2906-11
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|u http://dx.doi.org/10.1021/la304670c
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