Formation of palladium nanofilms using electrochemical atomic layer deposition (E-ALD) with chloride complexation

Pd thin films were formed by electrochemical atomic layer deposition (E-ALD) using surface-limited redox replacement (SLRR) of Cu underpotential deposits (UPD) on polycrystalline Au substrates. An automated electrochemical flow deposition system was used to deposit Pd atomic layers using a sequence...

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Publié dans:	Langmuir : the ACS journal of surfaces and colloids. - 1985. - 29(2013), 5 vom: 05. Feb., Seite 1592-600
Auteur principal:	Sheridan, Leah B (Auteur)
Autres auteurs:	Gebregziabiher, Daniel K, Stickney, John L, Robinson, David B
Format:	Article en ligne
Langue:	English
Publié:	2013
Accès à la collection:	Langmuir : the ACS journal of surfaces and colloids
Sujets:	Journal Article Research Support, U.S. Gov't, Non-P.H.S. Chlorides Palladium 5TWQ1V240M Gold 7440-57-5 Copper 789U1901C5