A new perfluoropolyether-based hydrophobic and chemically resistant photoresist structured by two-photon polymerization
Two-photon polymerization technology has been used to fabricate submicrometer three-dimensional (3D) structures using a new polyfunctional perfluoropolyether-based resist, which is a polymer intrinsically hydrophobic and chemically resistant. The fluorinated resist was designed and synthesized in th...
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Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 29(2013), 1 vom: 08. Jan., Seite 426-31
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| 1. Verfasser: |
De Marco, Carmela
(VerfasserIn) |
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| Weitere Verfasser: |
Gaidukeviciute, Arune,
Kiyan, Roman,
Eaton, Shane M,
Levi, Marinella,
Osellame, Roberto,
Chichkov, Boris N,
Turri, Stefano |
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| Format: | Online-Aufsatz
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| Sprache: | English |
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| Veröffentlicht: |
2013
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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| Schlagworte: | Journal Article |
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