Nanoscale block copolymer ordering induced by visible interferometric micropatterning a route towards large scale block copolymer 2D crystals

Nanoscale block copolymer ordering induced by visible interferometric micropatterning : a route towards large scale block copolymer 2D crystals

Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 25(2013), 2 vom: 11. Jan., Seite 213-7
1. Verfasser: Aissou, Karim (VerfasserIn)
Weitere Verfasser: Shaver, Jonah, Fleury, Guillaume, Pécastaings, Gilles, Brochon, Cyril, Navarro, Christophe, Grauby, Stéphane, Rampnoux, Jean-Michel, Dilhaire, Stefan, Hadziioannou, Georges
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2013
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Polymers
Beschreibung
Zusammenfassung:Copyright © 2013 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
We have overcome the cost and time consumption limitations of common lithography techniques used to control the self-assembly of block copolymers into highly ordered 2D arrays through the use of a guiding pattern created from a polymeric sub-layer. The guiding pattern is a sinusoidal surface-relief grating interferometrically inscribed onto an azobenzene containing copolymer sub-layer leading to a defect-free single grain of block copolymer domains
Beschreibung:Date Completed 27.09.2013
Date Revised 30.09.2020
published: Print-Electronic
Citation Status MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201203254