UV-initiated hydrosilylation on hydrogen-terminated silicon (111) : rate coefficient increase of two orders of magnitude in the presence of aromatic electron acceptors
UV-initiated (254 nm) hydrosilylation of hexadecene on Si(111)-H has been studied in the presence of various aliphatic and aromatic molecules (additives). Many of these additives cause an enhancement in the pseudo-first-order rate coefficient (k(obs)) of hydrosilylation, some up to 200× faster than...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 28(2012), 47 vom: 27. Nov., Seite 16285-93 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
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2012
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Online verfügbar |
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