|
|
|
|
| LEADER |
01000naa a22002652 4500 |
| 001 |
NLM221968660 |
| 003 |
DE-627 |
| 005 |
20231224053146.0 |
| 007 |
cr uuu---uuuuu |
| 008 |
231224s2012 xx |||||o 00| ||eng c |
| 024 |
7 |
|
|a 10.1021/la302880v
|2 doi
|
| 028 |
5 |
2 |
|a pubmed24n0740.xml
|
| 035 |
|
|
|a (DE-627)NLM221968660
|
| 035 |
|
|
|a (NLM)23083520
|
| 040 |
|
|
|a DE-627
|b ger
|c DE-627
|e rakwb
|
| 041 |
|
|
|a eng
|
| 100 |
1 |
|
|a Lo, Michael K F
|e verfasserin
|4 aut
|
| 245 |
1 |
0 |
|a Synthesis and micropatterning of photocatalytically reactive self-assembled monolayers covalently linked to Si(100) surfaces via a Si-C bond
|
| 264 |
|
1 |
|c 2012
|
| 336 |
|
|
|a Text
|b txt
|2 rdacontent
|
| 337 |
|
|
|a ƒaComputermedien
|b c
|2 rdamedia
|
| 338 |
|
|
|a ƒa Online-Ressource
|b cr
|2 rdacarrier
|
| 500 |
|
|
|a Date Completed 02.05.2013
|
| 500 |
|
|
|a Date Revised 20.11.2012
|
| 500 |
|
|
|a published: Print-Electronic
|
| 500 |
|
|
|a Citation Status PubMed-not-MEDLINE
|
| 520 |
|
|
|a Selective generation of an amine-terminated self-assembled monolayer bound to silicon wafers via a silicon-carbon linkage was realized by photocatalytically reducing the corresponding azide-terminated, self-assembled monolayers (Az-SAMs). The Az-SAM was obtained by thermal deposition of 11-chloroundecene onto a hydrogen-terminated silicon wafer followed by nucleophilic substitution of the chloride with the azide ion in warm N,N'-dimethylformamide (DMF). The presence of the terminal azide group on the SAM was confirmed by reflection absorption infrared spectroscopy (RAIRS), by X-ray photoelectron spectroscopy (XPS), and by detecting the formation of a triazole upon reaction of the azide with an activated alkyne. The desired terminal amine groups were generated by photocatalytic reduction of the Az-SAM with cadmium selenide quantum dots (CdSe Qdots) using λ > 400 nm. Analysis of the reduced SAM by XPS gave results that were consistent with those obtained with an amine-terminated surface obtained by reducing the Az-SAM with triphenylphosphine. To demonstrate the feasibility of using the Az-SAM for surface patterning, a sample was coated with adsorbed CdSe Qdots and exposed to the output of a diode laser at λ = 407 nm through a micropatterned mask. Using a SEM, the pattern formed in this manner was revealed after removing the CdSe Qdots and subsequently adsorbing 10 nm gold nanoparticles (AuNPs) to the positively charged terminal-amine groups. The formation of the pattern by CdSe-photocatalyzed reduction of the azide demonstrates a novel route to create features by selective modification of organic monolayers on silicon wafers
|
| 650 |
|
4 |
|a Journal Article
|
| 700 |
1 |
|
|a Gard, Matthew N
|e verfasserin
|4 aut
|
| 700 |
1 |
|
|a Goldsmith, Bryan R
|e verfasserin
|4 aut
|
| 700 |
1 |
|
|a Garcia-Garibay, Miguel A
|e verfasserin
|4 aut
|
| 700 |
1 |
|
|a Monbouquette, Harold G
|e verfasserin
|4 aut
|
| 773 |
0 |
8 |
|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1999
|g 28(2012), 46 vom: 20. Nov., Seite 16156-66
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
|
| 773 |
1 |
8 |
|g volume:28
|g year:2012
|g number:46
|g day:20
|g month:11
|g pages:16156-66
|
| 856 |
4 |
0 |
|u http://dx.doi.org/10.1021/la302880v
|3 Volltext
|
| 912 |
|
|
|a GBV_USEFLAG_A
|
| 912 |
|
|
|a SYSFLAG_A
|
| 912 |
|
|
|a GBV_NLM
|
| 912 |
|
|
|a GBV_ILN_22
|
| 912 |
|
|
|a GBV_ILN_350
|
| 912 |
|
|
|a GBV_ILN_721
|
| 951 |
|
|
|a AR
|
| 952 |
|
|
|d 28
|j 2012
|e 46
|b 20
|c 11
|h 16156-66
|