Gu, X., Dorsey, P., & Russell, T. P. (2012). High density and large area arrays of silicon oxide pillars with tunable domain size for mask etch applications. Advanced materials (Deerfield Beach, Fla.), 24(40), 5505. https://doi.org/10.1002/adma.201201278
Style de citation ChicagoGu, Xiaodan, Paul Dorsey, et Thomas P. Russell. "High Density and Large Area Arrays of Silicon Oxide Pillars with Tunable Domain Size for Mask Etch Applications." Advanced Materials (Deerfield Beach, Fla.) 24, no. 40 (2012): 5505. https://dx.doi.org/10.1002/adma.201201278.
Style de citation MLAGu, Xiaodan, et al. "High Density and Large Area Arrays of Silicon Oxide Pillars with Tunable Domain Size for Mask Etch Applications." Advanced Materials (Deerfield Beach, Fla.), vol. 24, no. 40, 2012, p. 5505.