Gu, X., Dorsey, P., & Russell, T. P. (2012). High density and large area arrays of silicon oxide pillars with tunable domain size for mask etch applications. Advanced materials (Deerfield Beach, Fla.), 24(40), 5505. https://doi.org/10.1002/adma.201201278
Chicago ZitierstilGu, Xiaodan, Paul Dorsey, und Thomas P. Russell. "High Density and Large Area Arrays of Silicon Oxide Pillars with Tunable Domain Size for Mask Etch Applications." Advanced Materials (Deerfield Beach, Fla.) 24, no. 40 (2012): 5505. https://dx.doi.org/10.1002/adma.201201278.
MLA ZitierstilGu, Xiaodan, et al. "High Density and Large Area Arrays of Silicon Oxide Pillars with Tunable Domain Size for Mask Etch Applications." Advanced Materials (Deerfield Beach, Fla.), vol. 24, no. 40, 2012, p. 5505.