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231224s2012 xx |||||o 00| ||eng c |
| 024 |
7 |
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|a 10.1021/la302113k
|2 doi
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|a pubmed24n0730.xml
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|a (DE-627)NLM219045216
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|a (NLM)22746532
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|a DE-627
|b ger
|c DE-627
|e rakwb
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| 041 |
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|a eng
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| 100 |
1 |
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|a Park, Ellane J
|e verfasserin
|4 aut
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| 245 |
1 |
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|a Using light to covalently immobilize and pattern nanoparticles onto surfaces
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|c 2012
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|a Text
|b txt
|2 rdacontent
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|a ƒaComputermedien
|b c
|2 rdamedia
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|a ƒa Online-Ressource
|b cr
|2 rdacarrier
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|a Date Completed 30.11.2012
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|a Date Revised 01.12.2018
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a There is considerable current interest in developing methods to integrate nanoparticles into optical, electronic, and biological systems due to their unique size-dependent properties and controllable shape. We report herein a versatile new approach for covalent immobilization of nanoparticles onto substrates modified with photoactive, phthalimide-functional, self-assembled monolayers. Upon illumination with UV radiation, the phthalimide group abstracts a hydrogen atom from a neighboring organic molecule, leading to radical-based photografting reactions. The approach is potentially "universal" since virtually any polymeric or organic-inorganic hybrid nanoparticle can be covalently immobilized in this fashion. Because grafting is confined to illuminated regions that undergo photoexcitation, masking provides a simple and direct method for nanoparticle patterning. To illustrate the technique, nanoparticles formed from diblock copolymers of poly(styrene-b-polyethylene oxide) and laden with Hostasol Red dye are photografted and patterned onto glass and silicon substrates modified with photoactive phthalimide-silane self-assembled monolayers. Atomic force microscopy and X-ray photoelectron spectroscopy are applied to characterize the grafted nanoparticle films while confocal fluorescence microscopy is used to image patterned nanoparticle deposition
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|a Journal Article
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|a Research Support, U.S. Gov't, Non-P.H.S.
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|a Phthalimides
|2 NLM
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|a Polystyrenes
|2 NLM
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|a Silanes
|2 NLM
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|a polystyrene-b-poly(ethylene oxide)
|2 NLM
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|a phthalimide
|2 NLM
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|a 1J6PQ7YI80
|2 NLM
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|a Congo Red
|2 NLM
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|a 3U05FHG59S
|2 NLM
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|a Polyethylene Glycols
|2 NLM
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|a 3WJQ0SDW1A
|2 NLM
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| 650 |
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|a Silicon
|2 NLM
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| 650 |
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|a Z4152N8IUI
|2 NLM
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| 700 |
1 |
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|a Wagenaar, Tina
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Zhang, Siyan
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Link, A James
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Prud'homme, Robert K
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Koberstein, Jeffrey T
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Turro, Nicholas J
|e verfasserin
|4 aut
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| 773 |
0 |
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|i Enthalten in
|t Langmuir : the ACS journal of surfaces and colloids
|d 1992
|g 28(2012), 29 vom: 24. Juli, Seite 10934-41
|w (DE-627)NLM098181009
|x 1520-5827
|7 nnns
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| 773 |
1 |
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|g volume:28
|g year:2012
|g number:29
|g day:24
|g month:07
|g pages:10934-41
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|u http://dx.doi.org/10.1021/la302113k
|3 Volltext
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