High-contrast photopatterning of photoluminescence within quantum dot films through degradation of a charge-transfer quencher

Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 24(2012), 27 vom: 17. Juli, Seite 3617-21
1. Verfasser: Tagliazucchi, Mario (VerfasserIn)
Weitere Verfasser: Amin, Victor A, Schneebeli, Severin T, Stoddart, J Fraser, Weiss, Emily A
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2012
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Research Support, U.S. Gov't, Non-P.H.S. Polyethylenes Quaternary Ammonium Compounds Viologens poly-N,N-dimethyl-N,N-diallylammonium chloride 26062-79-3
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520 |a Diffraction-limited, high-contrast photopatterning of the photoluminescence of layer-by-layer films comprising CdSeCdS@ZnS quantum dots and polyviologen is reported. The photoluminescence of the quantum dots is initially quantitatively quenched due to ultrafast photoinduced electron transfer to polyviologen. Photopatterning is achieved by high-power or prolonged illumination in air, which photochemically degrades the polyviologen and thereby restores the photoluminescence of the quantum dots 
650 4 |a Journal Article 
650 4 |a Research Support, Non-U.S. Gov't 
650 4 |a Research Support, U.S. Gov't, Non-P.H.S. 
650 7 |a Polyethylenes  |2 NLM 
650 7 |a Quaternary Ammonium Compounds  |2 NLM 
650 7 |a Viologens  |2 NLM 
650 7 |a poly-N,N-dimethyl-N,N-diallylammonium chloride  |2 NLM 
650 7 |a 26062-79-3  |2 NLM 
700 1 |a Amin, Victor A  |e verfasserin  |4 aut 
700 1 |a Schneebeli, Severin T  |e verfasserin  |4 aut 
700 1 |a Stoddart, J Fraser  |e verfasserin  |4 aut 
700 1 |a Weiss, Emily A  |e verfasserin  |4 aut 
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