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|a 10.1002/adma.201200485
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|a eng
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|a Falcaro, Paolo
|e verfasserin
|4 aut
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|a Patterning techniques for metal organic frameworks
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|c 2012
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|a Text
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|a ƒaComputermedien
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|a Date Completed 19.10.2012
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|a Date Revised 30.09.2020
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a The tuneable pore size and architecture, chemical properties and functionalization make metal organic frameworks (MOFs) attractive versatile stimuli-responsive materials. In this context, MOFs hold promise for industrial applications and a fervent research field is currently investigating MOF properties for device fabrication. Although the material properties have a crucial role, the ability to precisely locate the functional material is fundamental for device fabrication. In this progress report, advancements in the control of MOF positioning and precise localization of functional materials within MOF crystals are presented. Advantages and limitations of each reviewed technique are critically investigated, and several important gaps in the technological development for device fabrication are highlighted. Finally, promising patterning techniques are presented which are inspired by previous studies in organic and inorganic crystal patterning for the future of MOF lithography
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|a Journal Article
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|a Research Support, Non-U.S. Gov't
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|a Review
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|a Organometallic Compounds
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|a Buso, Dario
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|a Hill, Anita J
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|a Doherty, Cara M
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|t Advanced materials (Deerfield Beach, Fla.)
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