Flexible control of block copolymer directed self-assembly using small, topographical templates potential lithography solution for integrated circuit contact hole patterning

Flexible control of block copolymer directed self-assembly using small, topographical templates : potential lithography solution for integrated circuit contact hole patterning

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 24(2012), 23 vom: 19. Juni, Seite 3107-14, 3082
1. Verfasser: Yi, He (VerfasserIn)
Weitere Verfasser: Bao, Xin-Yu, Zhang, Jie, Bencher, Christopher, Chang, Li-Wen, Chen, Xiangyu, Tiberio, Richard, Conway, James, Dai, Huixiong, Chen, Yongmei, Mitra, Subhasish, Wong, H-S Philip
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2012
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Research Support, U.S. Gov't, Non-P.H.S. Methacrylates Polymers Polystyrenes polystyrene-block-poly(methyl methacrylate)
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700 1 |a Zhang, Jie  |e verfasserin  |4 aut 
700 1 |a Bencher, Christopher  |e verfasserin  |4 aut 
700 1 |a Chang, Li-Wen  |e verfasserin  |4 aut 
700 1 |a Chen, Xiangyu  |e verfasserin  |4 aut 
700 1 |a Tiberio, Richard  |e verfasserin  |4 aut 
700 1 |a Conway, James  |e verfasserin  |4 aut 
700 1 |a Dai, Huixiong  |e verfasserin  |4 aut 
700 1 |a Chen, Yongmei  |e verfasserin  |4 aut 
700 1 |a Mitra, Subhasish  |e verfasserin  |4 aut 
700 1 |a Wong, H-S Philip  |e verfasserin  |4 aut 
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