Tailoring nanostructures using copolymer nanoimprint lithography

Tailoring nanostructures using copolymer nanoimprint lithography

Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 24(2012), 15 vom: 17. Apr., Seite 1952-5
1. Verfasser: Thébault, Pascal (VerfasserIn)
Weitere Verfasser: Niedermayer, Stefan, Landis, Stefan, Chaix, Nicolas, Guenoun, Patrick, Daillant, Jean, Man, Xingkun, Andelman, David, Orland, Henri
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2012
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Research Support, U.S. Gov't, Non-P.H.S. Polymers
Beschreibung
Zusammenfassung:Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
The generation of defect-free polymer nanostructures by nanoimprinting methods is described. Long-range nanorheology and shorter-range surface energy effects can be efficiently combined to provide alignment of copolymer lamellae over several micrometers. As an example, a perpendicular organization with respect to circular tracks is shown, demonstrating the possibility of writing ordered radial nanostructures over large distances
Beschreibung:Date Completed 02.08.2012
Date Revised 30.09.2020
published: Print-Electronic
Citation Status MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201103532