Electrochemical deposition of germanium sulfide from room-temperature ionic liquids and subsequent Ag doping in an aqueous solution

A facile room-temperature electrochemical deposition process for germanium sulfide (GeS(x)) has been developed with the use of an ionic liquid as an electrolyte. The electrodeposition mechanism follows the induced codeposition of Ge and S precursors in ionic liquids generating GeS(x) films. The elec...

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Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 28(2012), 13 vom: 03. Apr., Seite 5513-7
1. Verfasser: Murugesan, Sankaran (VerfasserIn)
Weitere Verfasser: Kearns, Patrick, Stevenson, Keith J
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2012
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article
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520 |a A facile room-temperature electrochemical deposition process for germanium sulfide (GeS(x)) has been developed with the use of an ionic liquid as an electrolyte. The electrodeposition mechanism follows the induced codeposition of Ge and S precursors in ionic liquids generating GeS(x) films. The electrodeposited GeS(x) films were characterized by scanning electron microscopy-energy dispersive X-ray spectroscopy (SEM-EDS) and Raman and X-ray photoelectron spectroscopy (XPS). An aqueous-based Ag doping method was used to dope electrochemically grown GeS(x) films with controlled doping compared to the conventional process, which can be used in next-generation solid-state memory devices 
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700 1 |a Kearns, Patrick  |e verfasserin  |4 aut 
700 1 |a Stevenson, Keith J  |e verfasserin  |4 aut 
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