Direct observations of retention failure in ferroelectric memories

Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 24(2012), 8 vom: 21. Feb., Seite 1106-10
1. Verfasser: Gao, Peng (VerfasserIn)
Weitere Verfasser: Nelson, Christopher T, Jokisaari, Jacob R, Zhang, Yi, Baek, Seung-Hyub, Bark, Chung Wung, Wang, Enge, Liu, Yuanming, Li, Jiangyu, Eom, Chang-Beom, Pan, Xiaoqing
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2012
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, U.S. Gov't, Non-P.H.S. Oxides Lead 2P299V784P Zirconium C6V6S92N3C Titanium D1JT611TNE
LEADER 01000caa a22002652 4500
001 NLM215391608
003 DE-627
005 20250213161302.0
007 cr uuu---uuuuu
008 231224s2012 xx |||||o 00| ||eng c
024 7 |a 10.1002/adma.201103983  |2 doi 
028 5 2 |a pubmed25n0718.xml 
035 |a (DE-627)NLM215391608 
035 |a (NLM)22331626 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Gao, Peng  |e verfasserin  |4 aut 
245 1 0 |a Direct observations of retention failure in ferroelectric memories 
264 1 |c 2012 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 11.06.2012 
500 |a Date Revised 30.09.2020 
500 |a published: Print 
500 |a Citation Status MEDLINE 
520 |a Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. 
520 |a Nonvolatile ferroelectric random-access memory uses ferroelectric thin films to save a polar state written by an electric field that is retained when the field is removed. After switching, the high energy of the domain walls separating regions of unlike polarization can drive backswitching resulting in a loss of switched domain volume, or in the case of very small domains, complete retention loss 
650 4 |a Journal Article 
650 4 |a Research Support, U.S. Gov't, Non-P.H.S. 
650 7 |a Oxides  |2 NLM 
650 7 |a Lead  |2 NLM 
650 7 |a 2P299V784P  |2 NLM 
650 7 |a Zirconium  |2 NLM 
650 7 |a C6V6S92N3C  |2 NLM 
650 7 |a Titanium  |2 NLM 
650 7 |a D1JT611TNE  |2 NLM 
700 1 |a Nelson, Christopher T  |e verfasserin  |4 aut 
700 1 |a Jokisaari, Jacob R  |e verfasserin  |4 aut 
700 1 |a Zhang, Yi  |e verfasserin  |4 aut 
700 1 |a Baek, Seung-Hyub  |e verfasserin  |4 aut 
700 1 |a Bark, Chung Wung  |e verfasserin  |4 aut 
700 1 |a Wang, Enge  |e verfasserin  |4 aut 
700 1 |a Liu, Yuanming  |e verfasserin  |4 aut 
700 1 |a Li, Jiangyu  |e verfasserin  |4 aut 
700 1 |a Eom, Chang-Beom  |e verfasserin  |4 aut 
700 1 |a Pan, Xiaoqing  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Advanced materials (Deerfield Beach, Fla.)  |d 1998  |g 24(2012), 8 vom: 21. Feb., Seite 1106-10  |w (DE-627)NLM098206397  |x 1521-4095  |7 nnns 
773 1 8 |g volume:24  |g year:2012  |g number:8  |g day:21  |g month:02  |g pages:1106-10 
856 4 0 |u http://dx.doi.org/10.1002/adma.201103983  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_350 
951 |a AR 
952 |d 24  |j 2012  |e 8  |b 21  |c 02  |h 1106-10