Adhesion of microchannel-based complementary surfaces
We show that highly enhanced and selective adhesion can be achieved between surfaces patterned with complementary microchannel structures. An elastic material, poly(dimethylsiloxane) (PDMS), was used to fabricate such surfaces by molding into a silicon master with microchannel profiles patterned by...
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 28(2012), 9 vom: 06. März, Seite 4213-22 |
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| 1. Verfasser: | |
| Weitere Verfasser: | , , , |
| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2012
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article Research Support, U.S. Gov't, Non-P.H.S. Dimethylpolysiloxanes baysilon 63148-62-9 |
| Zusammenfassung: | We show that highly enhanced and selective adhesion can be achieved between surfaces patterned with complementary microchannel structures. An elastic material, poly(dimethylsiloxane) (PDMS), was used to fabricate such surfaces by molding into a silicon master with microchannel profiles patterned by photolithography. We carried out adhesion tests on both complementary and mismatched microchannel/micropillar surfaces. Adhesion, as measured by the energy release rate required to propagate an interfacial crack, can be enhanced by up to 40 times by complementary interfaces, compared to a flat control, and slightly enhanced for some special noncomplementary samples, despite the nearly negligible adhesion for other mismatched surfaces. For each complementary surface, we observe defects in the form of visible striations, where pillars fail to insert fully into the channels. The adhesion between complementary microchannel surfaces is enhanced by a combination of a crack-trapping mechanism and friction between a pillar and channel and is attenuated by the presence of defects |
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| Beschreibung: | Date Completed 29.06.2012 Date Revised 06.03.2012 published: Print-Electronic Citation Status MEDLINE |
| ISSN: | 1520-5827 |
| DOI: | 10.1021/la204519w |