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231224s2012 xx |||||o 00| ||eng c |
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|a 10.1002/adma.201103357
|2 doi
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|a eng
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|a Laza, Simona C
|e verfasserin
|4 aut
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|a Two-photon continuous flow lithography
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|c 2012
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|a Text
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|a ƒaComputermedien
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|2 rdamedia
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|a ƒa Online-Ressource
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|a Date Completed 29.06.2012
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|a Date Revised 30.09.2020
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|a published: Print-Electronic
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|a Citation Status MEDLINE
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|a Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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|a A new approach for microfluidics-based production of polymeric particles, namely two-photon continuous flow lithography, is reported. This technique takes advantage of two-photon lithography to create objects with sub-micrometer and 3D features, and overcomes the traditional process limitations of two-photon lithography by using multiple beam production under continuous flow. Polymeric fibers, helical and bow-tie particles with sub-diffraction resolution and surface roughness as low as 10 nm are demonstrated
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|a Journal Article
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|a Polymers
|2 NLM
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|a Polo, Marco
|e verfasserin
|4 aut
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| 700 |
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|a Neves, Antonio A R
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Cingolani, Roberto
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Camposeo, Andrea
|e verfasserin
|4 aut
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| 700 |
1 |
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|a Pisignano, Dario
|e verfasserin
|4 aut
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| 773 |
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|i Enthalten in
|t Advanced materials (Deerfield Beach, Fla.)
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|g 24(2012), 10 vom: 08. März, Seite 1304-8
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