Two-dimensional polymer as a mask for surface nanopatterning

Two-dimensional polymer as a mask for surface nanopatterning

Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Deerfield Beach, Fla.). - 1998. - 24(2012), 9 vom: 02. März, Seite 1252-4
1. Verfasser: Clair, Sylvain (VerfasserIn)
Weitere Verfasser: Ourdjini, Oualid, Abel, Mathieu, Porte, Louis
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2012
Zugriff auf das übergeordnete Werk:Advanced materials (Deerfield Beach, Fla.)
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Boronic Acids Polymers Sodium Chloride 451W47IQ8X Iron E1UOL152H7
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520 |a NaCl islands are used as a sacrificial layer to selectively deposit a boronic acid based two-dimensional polymer. The nanostructured polymer layer can be used as a negative mask to create Fe islands in a nanolithography mimicking process 
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650 4 |a Research Support, Non-U.S. Gov't 
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700 1 |a Ourdjini, Oualid  |e verfasserin  |4 aut 
700 1 |a Abel, Mathieu  |e verfasserin  |4 aut 
700 1 |a Porte, Louis  |e verfasserin  |4 aut 
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