Electrodeposition of CuInSe2 (CIS) via electrochemical atomic layer deposition (E-ALD)
The growth of stoichiometric CuInSe(2) (CIS) on Au substrates using electrochemical atomic layer deposition (E-ALD) is reported here. Parameters for a ternary E-ALD cycle were investigated and included potentials, step sequence, solution compositions and timing. CIS was also grown by combining cycle...
Ausführliche Beschreibung
Bibliographische Detailangaben
Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 28(2012), 5 vom: 07. Feb., Seite 3024-31
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1. Verfasser: |
Banga, Dhego
(VerfasserIn) |
Weitere Verfasser: |
Jarayaju, Nagarajan,
Sheridan, Leah,
Kim, Youn-Geun,
Perdue, Brian,
Zhang, Xin,
Zhang, Qinghui,
Stickney, John |
Format: | Online-Aufsatz
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Sprache: | English |
Veröffentlicht: |
2012
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Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
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Schlagworte: | Journal Article |