Electrically conducting nanopatterns formed by chemical e-beam lithography via gold nanoparticle seeds
We report the formation of thiol nanopatterns on SAM covered silicon wafers by converting sulfonic acid head groups via e-beam lithography. These thiol groups act as binding sites for gold nanoparticles, which can be enhanced to form electrically conducting nanostructures. This approach serves as a...
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1985. - 28(2012), 5 vom: 07. Feb., Seite 2448-54
|
|---|
| 1. Verfasser: |
Schaal, Patrick A
(VerfasserIn) |
|---|
| Weitere Verfasser: |
Besmehn, Astrid,
Maynicke, Eva,
Noyong, Michael,
Beschoten, Bernd,
Simon, Ulrich |
|---|
| Format: | Online-Aufsatz
|
|---|
| Sprache: | English |
|---|
| Veröffentlicht: |
2012
|
|---|
| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids
|
|---|
| Schlagworte: | Journal Article
Research Support, Non-U.S. Gov't
Sulfhydryl Compounds
Gold
7440-57-5
Silicon
Z4152N8IUI |
|---|