Improved screening ability of ferroelectric-semiconductor interface

Recent progress in integrating ferroelectrics directly on silicon opens the exciting possibility of implementing ferroelectric-semiconductor devices. One of the major problems for such integration is the instability of the ferroelectric state in very thin films, which is mainly controlled by the scr...

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Bibliographische Detailangaben
Veröffentlicht in:IEEE transactions on ultrasonics, ferroelectrics, and frequency control. - 1986. - 58(2011), 9 vom: 15. Sept., Seite 1959-61
1. Verfasser: Gureev, Maxim Y (VerfasserIn)
Weitere Verfasser: Tagantsev, Alexander K, Setter, Nava
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2011
Zugriff auf das übergeordnete Werk:IEEE transactions on ultrasonics, ferroelectrics, and frequency control
Schlagworte:Journal Article Research Support, Non-U.S. Gov't