Light emission from nanocrystalline Si inverse opals and controlled passivation by atomic layer deposited Al2O3

Light emission from nanocrystalline Si inverse opals and controlled passivation by atomic layer deposited Al2O3

Détails bibliographiques
Publié dans:Advanced materials (Deerfield Beach, Fla.). - 1998. - 23(2011), 44 vom: 23. Nov., Seite 5219-23
Auteur principal: Gallego-Gómez, Francisco (Auteur)
Autres auteurs: Ibisate, Marta, Golmayo, Dolores, Palomares, F Javier, Herrera, Miriam, Hernández, Jesús, Molina, Sergio I, Blanco, Alvaro, López, Cefe
Format: Article en ligne
Langue:English
Publié: 2011
Accès à la collection:Advanced materials (Deerfield Beach, Fla.)
Sujets:Journal Article Research Support, Non-U.S. Gov't Aluminum Oxide LMI26O6933 Silicon Z4152N8IUI
Description
Description:Date Completed 16.04.2012
Date Revised 30.09.2020
published: Print-Electronic
Citation Status MEDLINE
ISSN:1521-4095
DOI:10.1002/adma.201101797