Fabrication of colloidal grid network by two-step convective self-assembly

We explored a "template-free" approach to arranging colloidal particles into a network pattern by a convective self-assembly technique. In this approach, which we call "two-step convective self-assembly," a stripe pattern of colloidal particles is first prepared on a substrate by...

Ausführliche Beschreibung

Bibliographische Detailangaben
Veröffentlicht in:Langmuir : the ACS journal of surfaces and colloids. - 1992. - 27(2011), 9 vom: 03. Mai, Seite 5290-5
1. Verfasser: Mino, Yasushi (VerfasserIn)
Weitere Verfasser: Watanabe, Satoshi, Miyahara, Minoru T
Format: Online-Aufsatz
Sprache:English
Veröffentlicht: 2011
Zugriff auf das übergeordnete Werk:Langmuir : the ACS journal of surfaces and colloids
Schlagworte:Journal Article Research Support, Non-U.S. Gov't Colloids Silver 3M4G523W1G Silicon Dioxide 7631-86-9
LEADER 01000naa a22002652 4500
001 NLM207130965
003 DE-627
005 20231224001419.0
007 cr uuu---uuuuu
008 231224s2011 xx |||||o 00| ||eng c
024 7 |a 10.1021/la200515w  |2 doi 
028 5 2 |a pubmed24n0690.xml 
035 |a (DE-627)NLM207130965 
035 |a (NLM)21456574 
040 |a DE-627  |b ger  |c DE-627  |e rakwb 
041 |a eng 
100 1 |a Mino, Yasushi  |e verfasserin  |4 aut 
245 1 0 |a Fabrication of colloidal grid network by two-step convective self-assembly 
264 1 |c 2011 
336 |a Text  |b txt  |2 rdacontent 
337 |a ƒaComputermedien  |b c  |2 rdamedia 
338 |a ƒa Online-Ressource  |b cr  |2 rdacarrier 
500 |a Date Completed 11.08.2011 
500 |a Date Revised 25.11.2016 
500 |a published: Print-Electronic 
500 |a Citation Status MEDLINE 
520 |a We explored a "template-free" approach to arranging colloidal particles into a network pattern by a convective self-assembly technique. In this approach, which we call "two-step convective self-assembly," a stripe pattern of colloidal particles is first prepared on a substrate by immersing it in a suspension. The substrate with the stripes is then rotated by 90° and again immersed in the suspension to produce stripes perpendicular to the first ones, resulting in a grid-pattern network of colloidal arrays. The width of the colloidal grid lines can be controlled by changing the particle concentration while maintaining an almost constant spacing between the lines. On the basis of these results, we propose a mechanism for grid pattern formation. Our method is applicable to various types of particles. In addition, the wide applicability of this method was employed to create a hybrid grid pattern 
650 4 |a Journal Article 
650 4 |a Research Support, Non-U.S. Gov't 
650 7 |a Colloids  |2 NLM 
650 7 |a Silver  |2 NLM 
650 7 |a 3M4G523W1G  |2 NLM 
650 7 |a Silicon Dioxide  |2 NLM 
650 7 |a 7631-86-9  |2 NLM 
700 1 |a Watanabe, Satoshi  |e verfasserin  |4 aut 
700 1 |a Miyahara, Minoru T  |e verfasserin  |4 aut 
773 0 8 |i Enthalten in  |t Langmuir : the ACS journal of surfaces and colloids  |d 1992  |g 27(2011), 9 vom: 03. Mai, Seite 5290-5  |w (DE-627)NLM098181009  |x 1520-5827  |7 nnns 
773 1 8 |g volume:27  |g year:2011  |g number:9  |g day:03  |g month:05  |g pages:5290-5 
856 4 0 |u http://dx.doi.org/10.1021/la200515w  |3 Volltext 
912 |a GBV_USEFLAG_A 
912 |a SYSFLAG_A 
912 |a GBV_NLM 
912 |a GBV_ILN_22 
912 |a GBV_ILN_350 
912 |a GBV_ILN_721 
951 |a AR 
952 |d 27  |j 2011  |e 9  |b 03  |c 05  |h 5290-5