Role of substrate wettability in the "bubble deposition method" applied to the CeVO4 nanowire films
© 2011 American Chemical Society
| Veröffentlicht in: | Langmuir : the ACS journal of surfaces and colloids. - 1992. - 27(2011), 8 vom: 19. Apr., Seite 4397-402 |
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| Format: | Online-Aufsatz |
| Sprache: | English |
| Veröffentlicht: |
2011
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| Zugriff auf das übergeordnete Werk: | Langmuir : the ACS journal of surfaces and colloids |
| Schlagworte: | Journal Article |
| Zusammenfassung: | © 2011 American Chemical Society Homogeneous two-dimensional structures of CeVO(4) nanowires (NWs) deposited on silicon substrates are obtained by means of the bubble deposition method (BDM). Surface wettability (i.e., surface energy) and film ripening (i.e., film thickness) are two major parameters in nanoparticle confinement and deposition. As the presence of surfactant could be detrimental to applications, a washing treatment is developed without CeVO(4) chemical changes or NW film modifications. Careful investigations of the film topography are carried out by atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS) is used to check the chemical composition of the film at different stages. Finally, samples made by BDM are compared to those made by dip-coating method, demonstrating the higher efficiency of the BDM in providing large areas of well-organized and dense CeVO(4) monolayer |
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| Beschreibung: | Date Completed 26.08.2011 Date Revised 12.04.2011 published: Print-Electronic Citation Status PubMed-not-MEDLINE |
| ISSN: | 1520-5827 |
| DOI: | 10.1021/la104635v |