Nanostructures and functional materials fabricated by interferometric lithography
Interferometric lithography (IL) is a powerful technique for the definition of large-area, nanometer-scale, periodically patterned structures. Patterns are recorded in a light-sensitive medium, such as a photoresist, that responds nonlinearly to the intensity distribution associated with the interfe...
Ausführliche Beschreibung
Bibliographische Detailangaben
| Veröffentlicht in: | Advanced materials (Deerfield Beach, Fla.). - 1998. - 23(2011), 2 vom: 11. Jan., Seite 147-79
|
|---|
| 1. Verfasser: |
Xia, Deying
(VerfasserIn) |
|---|
| Weitere Verfasser: |
Ku, Zahyun,
Lee, S C,
Brueck, S R J |
|---|
| Format: | Online-Aufsatz
|
|---|
| Sprache: | English |
|---|
| Veröffentlicht: |
2011
|
|---|
| Zugriff auf das übergeordnete Werk: | Advanced materials (Deerfield Beach, Fla.)
|
|---|
| Schlagworte: | Journal Article
Research Support, U.S. Gov't, Non-P.H.S.
Review |
|---|